High Density Plasma Etching System for Waveguides
- Company Name:A-Tech System
- Membership:Free Member
- Member Since:2012. 09.13
- Country/Region:Korea
- City:Incheon
- Contact:Yoon Choi
- Related Keywords:High densty plasma, Dry Etch, Etching
A-Tech SystemContact us
A-Tech System
[Korea]
Metal etching, Silica etching, Polymer etching
Special Features
TCP etching system with 3 chambers for R&D and small scale production.
Automatic robot transporting system.
ESC (Electro Static Chuck) and He cooling system for silica etching.
Average throughput Up to 250,000 wafers per year.
Specifications
Wafer capacity : 1 × 6"
Dimension : 1,810L × 1,800H × 1,222W (mm3)
Power : AC 3kW for TCP source(13.56MHz)
AC 600W for bias voltage(13.56MHz)
Gas : CF4 / O2 / He / SF6
Substrate material : Si/SiO2
Pump : Rotary(600 l/min, 900 l/min) & Turbo(500 l/s, 1000 l/s)
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