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High Density Plasma Etching System for Waveguides

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A-Tech System
[Korea]

Address
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea Incheon Incheon
Phone
82-32-5088067
Contact name
Yoon Choi

Quick Information

  • Place of Origin: Korea
  • Model Number : Cluster Etch-300

Description

Metal etching, Silica etching, Polymer etching

Special Features

TCP etching system with 3 chambers for R&D and small scale production.
Automatic robot transporting system.
ESC (Electro Static Chuck) and He cooling system for silica etching.
Average throughput Up to 250,000 wafers per year.

Specifications

Wafer capacity : 1 × 6"
Dimension : 1,810L × 1,800H × 1,222W (mm3)
Power : AC 3kW for TCP source(13.56MHz)
AC 600W for bias voltage(13.56MHz)
Gas : CF4 / O2 / He / SF6
Substrate material : Si/SiO2
Pump : Rotary(600 l/min, 900 l/min) & Turbo(500 l/s, 1000 l/s)
 


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