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A-Tech System
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Developed itmes
- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment
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[ Buying Categories ]
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[ Selling Categories ]
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[ keyword ]
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 Registration Date |
2012/09/13 (Year/Month/Date) |
| Buyer / Seller in EC21 |
Seller |
| Business Type |
Manufacturer |
| Year established |
1995 |
| Employees total |
11 - 50 |
| Annual revenue |
USD 5,000,001 - 10,000,000 |
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Contact Information |
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| Company |
A-Tech System |
| Address |
175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea Incheon Incheon Korea |
| Phone |
82 - 32 - 5088067 |
| Fax |
82 - 32 - 5088069 |
| Homepage |
http://www.atechsystem.co.kr |
| Contact |
Yoon Choi / Research Director
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