ICP CVD system for Graphene and Boron Carbide Layers
- Company Name:A-Tech System
- Membership:Free Member
- Member Since:2012. 09.13
- Country/Region:Korea
- City:Incheon
- Contact:Yoon Choi
- Related Keywords:Magnetron, Sputter, PVD
A-Tech System
Contact us
A-Tech System
[Korea]
- Address
- 175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea Incheon Incheon
- Phone
- 82-32-5088067
- Contact name
- Yoon Choi
Quick Information
- Place of Origin: Korea
- Model Number : PECVD Lab 200
Description
Graphene synthesis
Special Features
Multi-functional CVD system combined with ICP CVD and probe station.
Maximum substrate temperature: 1,000°C.
Automatic loading available during susceptor heating.
High density plasma source.
PC-control system.
Specifications
Wafer capacity : 6" wafer x 1
Average throughput: 4,800 wafer/year
Dimension : 1,500W × 1,800D × 1,830H (mm3)
Power : ICP Power supply
Bias power supply
Heater : Heating element - SiC coated graphite(max. temp.:1,200°C)
Gas : Ar/CH4/H2/B2H2/C2H2/O2/N2/NH3
Pump : dry pump, turbo pump, booster pump
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